Characterization and Microstructure of Titanium Dioxide Prepared by Radio Frequency Magnetron Sputtering

Titanium oxide (TiO2) thin films were deposited by RF magnetron sputtering on Si and glass substrates. The microstructure, surface morphology, and optical properties of the thin films were investigated by grazing incidence X-ray diffraction (GIXD), transmission electron microscopy (TEM), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), and UV/VIS spectrophotometer. Both XRD and TEM results show that the microstructure and crystallinity of the coatings depend upon the O2 / (Ar+O2) ratio and deposition time. At low O2 / (Ar+O2) ratio and short deposition time, the amorphous phase prevailed; and vice versa for the crystalline phases, anatase and rutile. Surface morphology and roughness of the coatings also vary with oxygen partial pressure and deposition time. Although the coating thickness of the thin films increases with the deposition time, the optical transmittance of the films remains approximately constant (~85%). Keyword: Titanium dioxide thin film, RF sputtering technique, optical properties, XRD, AFM, TEM, FE-SEM * Electrochemical Society Active Member z E-mail:[email protected] 1